Chemical vapor deposition is a vapor-phase growth method for preparing materials. It is to pass one or several compounds and elemental gases containing elements that make up thin films into a reaction chamber where a substrate is placed, and deposit on the surface of the substrate by means of a space gas-phase chemical reaction. Process technology for solid-state thin films.
Chemical vapor deposition is a film-forming technology that uses gaseous substances to form solid-state thin films on the surface of substrates through chemical reactions. It is mainly divided into four important stages: 1. The reactive gas diffuses to the surface of the substrate; 2. The reactive gas is adsorbed on the surface of the substrate; 3. The gas phase by-products generated on the surface of the substrate are separated from the surface; 4. The remaining reactants form a coating. layer.
Chemical vapor deposition can form a variety of metal, alloy, ceramic and compound coatings through various reactions and control the density and purity of the coating; the chemical composition of the coating can be changed with the composition of the gas phase to obtain gradient deposits Or get a hybrid coating; the use of plasma and laser-assisted technology can significantly promote chemical reactions, so that deposition can be carried out at lower temperatures; good wrapping performance, can coat with grooves, grooves, holes, and even blind holes characteristics of workpieces.
Modern science and technology require the use of a large number of new inorganic materials with different functions. These functional materials must be of high purity. However, many preparation methods that we are familiar with in the past, such as high-temperature smelting, precipitation and crystallization in aqueous solutions, are often difficult to meet these requirements. It is also difficult to guarantee a high-purity product. Chemical vapor deposition is a new technology for preparing inorganic materials developed in recent decades. Chemical vapor deposition has been widely used to purify substances, develop new crystals, and deposit various single crystal, polycrystalline or glassy inorganic thin film materials. These materials can be oxides, sulfides, nitrides, carbides, and their physical function can be precisely controlled by the deposition process of vapor doping. At present, chemical vapor deposition has become a new field of inorganic synthetic chemistry.
